Base: $167,000.00 - $333,000.00 a year; bonus/equi...
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High na euv lithography expertise
Semiconductor process experience
People leadership with direct reports
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Micron Technology is seeking a High Na EUV Albany Site Photo Director to lead initiatives in the development of High NA EUV lithography technologies. The ideal candidate will have extensive semiconductor experience, strong leadership skills, and a solid understanding of photolithography processes.
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Job Summary
Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence.
This role offers broad collaboration, hands-on technical leadership, and meaningful visibility across Micron’s global Technology Development network.
Micron benefits include medical, dental, vision plans, income protection, paid family leave, paid time off, and holidays designed to support personal wellbeing and professional growth.
Matching Summary
Match Score: 75
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Micron Technology is seeking a High Na EUV Albany Site Photo Director to lead initiatives in the development of High NA EUV lithography technologies. The ideal candidate will have extensive semiconductor experience, strong leadership skills, and a solid understanding of photolithography processes.
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Salary
Base: $167,000.00 - $333,000.00 a year; Bonus/Equity: May include bonuses and equity; Benefits: Medical, dental, vision, income protection, paid leave, paid time off
Skills & Requirements
Must-have
High NA EUV lithography expertise
Semiconductor process experience
People leadership with direct reports
Photolithography optics or simulation tools
Statistical data analysis using JMP or Python
Coordination of tool time and logistics
Nice-to-have
Technical roadmap definition
Cross-site global collaboration
Vendor partnership experience
Executive-level communication skills
Demo or development activities leadership
Key Requirements
B.S. in Engineering, Chemistry, Physics or related field with 15+ years experience
M.S./Ph.D. with 10+ years semiconductor process experience
5+ years people-leadership experience with at least 5 direct reports
Strong understanding of EUV lithography and 193nm immersion multiple-patterning processes