15-20 years dry etch process development experience
Deep expertise in plasma physics and chemistry
Experience with high aspect ratio silicon/dielectric etches
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Micron Semiconductor Asia Operations is seeking a distinguished member of the technical staff (DMTS) for their Advanced NAND Dry Etch team in Singapore. The ideal candidate will possess extensive experience in dry etch process development, particularly within NAND and DRAM technologies, and will be responsible for leading innovation and technical mentorship within the organization.
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Job Summary
This role involves leading the advancement of dry etch technology and defining the equipment roadmap for next-generation NAND products.
The successful candidate will act as a top industry expert, resolving complex yield and defectivity challenges through deep domain knowledge.
Candidates are expected to provide technical mentorship to less experienced engineers and represent Micron at international technical forums.
Matching Summary
Match Score: 75
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Micron Semiconductor Asia Operations is seeking a distinguished member of the technical staff (DMTS) for their Advanced NAND Dry Etch team in Singapore. The ideal candidate will possess extensive experience in dry etch process development, particularly within NAND and DRAM technologies, and will be responsible for leading innovation and technical mentorship within the organization.
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Skills & Requirements
Must-have
15-20 years dry etch process development experience
Deep expertise in plasma physics and chemistry
Experience with high aspect ratio silicon/dielectric etches
Leadership in R&D moving into manufacturing roles
Knowledge of RF sources and plasma reactor types
Nice-to-have
Data science basics and Python coding skills
AI based solution implementation experience
Strong presentation skills for executive meetings
Experience mentoring SMTS/STS engineers
Background in advanced conventional pulsing schemes
Key Requirements
PhD or BS/MS with 18+ years pertinent experience
15-20 years in dry etch R&D within memory products
Proven track record in scaling problems for NAND technology